Thickness effect on Schottky diode characteristics of ZnO thin film

Jyoti Nayak, Yi Chen, Kwang Sun Kang, Jaehwan Kim

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

Surface morphologies of the ZnO thin films with various thicknesses have been investigated. ZnO sol was prepared with zinc acetate dihydrate, 2-methoxyethanol, and monoethanolamine. Thicknesses of the ZnO films were controlled by a multiple coating process. The ZnO thin films were annealed at 750°C. The film thickness increased as the coating time increased. From the XRD study, it is observed that the ZnO films exhibit wurtzite structure (002) and the diffraction intensity increased as the thickness increased. Effect of thickness on Schottky behavior was evaluated by measuring current-voltage characteristics. The pristine ZnO thin films with thickness of 132 nm exhibited Schottky diode characteristics with high rectification ratio.

Original languageEnglish
Title of host publicationNanosensors, Biosensors, and Info-Tech Sensors and Systems 2010
DOIs
StatePublished - 2010
EventNanosensors, Biosensors, and Info-Tech Sensors and Systems 2010 - San Diego, CA, United States
Duration: 8 Mar 201011 Mar 2010

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume7646
ISSN (Print)0277-786X

Conference

ConferenceNanosensors, Biosensors, and Info-Tech Sensors and Systems 2010
Country/TerritoryUnited States
CitySan Diego, CA
Period8/03/1011/03/10

Keywords

  • Atomic force microscopy
  • Schottky diode
  • X-ray diffraction
  • ZnO

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