Photoluminescence characteristics of GaN nanoparticles

Y. Chen, K. S. Kang, N. Jyoti, Jaehwan Kim

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

GaN nanoparticles have been fabricated with sol-gel method using Ga(NO 3)3 as a presusor, HNO3 as a solvent, NH 3OH as a pH adjusting agent, and citric acid as a chelating agent. After adding citric acid the solution became clear. The solution was poured to Petri dish and dried at 400 °C for 4 h. The resulting Ga2O 3 was gray colored powder. The gallium oxide power was put to the Al-crucible and annealed at 900 °C for 1 h. The resulting nanoparticles have been investigated using energy dispersive spectroscopy (EDS), x-ray diffeactometer, transmission electron microscopy (TEM), and fluorometer. The TEM images show that the GaN nanoparticle size was approximately 8-13 nm. X-ray diffraction patterns provide characteristic GaN diffraction peaks. There are two sharp photoluminescence (PL) peaks centered at 371 nm and 483 nm and broad PL peak between 400-600 nm.

Original languageEnglish
Title of host publicationNanotechnology 2010
Subtitle of host publicationAdvanced Materials, CNTs, Particles, Films and Composites - Technical Proceedings of the 2010 NSTI Nanotechnology Conference and Expo, NSTI-Nanotech 2010
Pages469-474
Number of pages6
StatePublished - 2010
EventNanotechnology 2010: Advanced Materials, CNTs, Particles, Films and Composites - 2010 NSTI Nanotechnology Conference and Expo, NSTI-Nanotech 2010 - Anaheim, CA, United States
Duration: 21 Jun 201024 Jun 2010

Publication series

NameNanotechnology 2010: Advanced Materials, CNTs, Particles, Films and Composites - Technical Proceedings of the 2010 NSTI Nanotechnology Conference and Expo, NSTI-Nanotech 2010
Volume1

Conference

ConferenceNanotechnology 2010: Advanced Materials, CNTs, Particles, Films and Composites - 2010 NSTI Nanotechnology Conference and Expo, NSTI-Nanotech 2010
Country/TerritoryUnited States
CityAnaheim, CA
Period21/06/1024/06/10

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