@inproceedings{4ba716bc41054ee1811cd013f51633aa,
title = "Optical properties of high absorption films for binary masks in extreme ultraviolet lithography",
abstract = "We studied telluride compounds and transparent conductive oxides as high absorption materials for binary masks of extreme ultraviolet lithography at 13.5-nm wavelength. Their optical and structural properties are described.",
author = "Kang, {Hee Young} and Sungjin Park and Lim, {Jai Dong} and Pazhanisami Peranantham and Hwangbo, {Chang Kwon}",
year = "2013",
doi = "10.1364/oic.2013.fc.1",
language = "English",
isbn = "9781557529701",
series = "Optics InfoBase Conference Papers",
publisher = "Optical Society of America (OSA)",
booktitle = "Optical Interference Coatings, OIC 2013",
note = "Optical Interference Coatings, OIC 2013 ; Conference date: 16-06-2013 Through 21-06-2013",
}