TY - JOUR
T1 - Novel Boosting Scheme Using Asymmetric Pass Voltage for Reducing Program Disturbance in 3-Dimensional NAND Flash Memory
AU - Kwon, Dae Woong
AU - Lee, Junil
AU - Kim, Sihyun
AU - Lee, Ryoongbin
AU - Kim, Sangwan
AU - Lee, Jong Ho
AU - Park, Byung Gook
N1 - Publisher Copyright:
© 2013 IEEE.
PY - 2018/2/1
Y1 - 2018/2/1
N2 - In this paper, novel boosting scheme using asymmetric pass voltage ( \text{V}-{\mathrm{ pass}} ) is proposed to obtain high channel boosting potential and to reduce program disturbance in 3-D NAND flash memory. The proposed scheme has the same program bias and timing conditions as conventional self-boosting except for \text{V}-{\mathrm{ pass}} voltages applied to both adjacent word-lines of selected word-line (WLsel). Reduced \text{V}-{\mathrm{ pass}} ( \text{V}-{\mathrm{ pass1}} =\,\,\text{V}-{\mathrm{ pass}} - {\Delta }\text{V} ) is applied to previous word-line (WL -{\rm n-{1}} ) of WLsel and increased \text{V}-{\mathrm{ pass}} ( \text{V}-{\mathrm{ pass2}} =\,\,\text{V}-{\mathrm{ pass}}+{\Delta }\text{V} ) is applied to next word-line (WL -{\rm n+{1}} ). In this scheme, the \text{V}-{\mathrm{ pass1}} cuts the channel off and causes local boosting when the channel potentials of inhibit strings are boosted up. Meanwhile, the \text{V}-{\mathrm{ pass2}} compensates the program speed reduction of selected cell (cellsel) induced by the decreased voltage of the \text{V}-{\mathrm{ pass1}}. Through the measurements of program disturbance in fabricated devices, it is revealed that the program disturbance is significantly improved without the reduction of program speed by the proposed scheme. Furthermore, the \text{V}-{\mathrm{ pass1}} and \text{V}-{\mathrm{ pass2}} are optimized to maximize the improvement.
AB - In this paper, novel boosting scheme using asymmetric pass voltage ( \text{V}-{\mathrm{ pass}} ) is proposed to obtain high channel boosting potential and to reduce program disturbance in 3-D NAND flash memory. The proposed scheme has the same program bias and timing conditions as conventional self-boosting except for \text{V}-{\mathrm{ pass}} voltages applied to both adjacent word-lines of selected word-line (WLsel). Reduced \text{V}-{\mathrm{ pass}} ( \text{V}-{\mathrm{ pass1}} =\,\,\text{V}-{\mathrm{ pass}} - {\Delta }\text{V} ) is applied to previous word-line (WL -{\rm n-{1}} ) of WLsel and increased \text{V}-{\mathrm{ pass}} ( \text{V}-{\mathrm{ pass2}} =\,\,\text{V}-{\mathrm{ pass}}+{\Delta }\text{V} ) is applied to next word-line (WL -{\rm n+{1}} ). In this scheme, the \text{V}-{\mathrm{ pass1}} cuts the channel off and causes local boosting when the channel potentials of inhibit strings are boosted up. Meanwhile, the \text{V}-{\mathrm{ pass2}} compensates the program speed reduction of selected cell (cellsel) induced by the decreased voltage of the \text{V}-{\mathrm{ pass1}}. Through the measurements of program disturbance in fabricated devices, it is revealed that the program disturbance is significantly improved without the reduction of program speed by the proposed scheme. Furthermore, the \text{V}-{\mathrm{ pass1}} and \text{V}-{\mathrm{ pass2}} are optimized to maximize the improvement.
KW - 3-D NAND flash memory
KW - asymmetric pass voltage
KW - local-boosting scheme
KW - program disturbance
UR - http://www.scopus.com/inward/record.url?scp=85041684247&partnerID=8YFLogxK
U2 - 10.1109/JEDS.2018.2801219
DO - 10.1109/JEDS.2018.2801219
M3 - Article
AN - SCOPUS:85041684247
SN - 2168-6734
VL - 6
SP - 286
EP - 290
JO - IEEE Journal of the Electron Devices Society
JF - IEEE Journal of the Electron Devices Society
IS - 1
ER -