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Molecular modeling of EUV photoresist revealing the effect of chain conformation on line-edge roughness formation
Juhae Park, Sung Gyu Lee, Yannick Vesters, Joren Severi, Myungwoong Kim, Danilo De Simone, Hye Keun Oh, Su Mi Hur
Research output: Contribution to journal › Article › peer-review
15
Scopus
citations