Microfabricated heteroepitaxial oxide structures on silicon for bolometric arrays

Joo Hyung Kim, Alexander M. Grishin

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

The microfabrication of the free standing perovskite La0.67(Sr, Ca)0.33MnO3 (LSCMO) thin films on silicon substrates with epitaxial grown oxide buffer layers was investigated for microbolometer application. The Ar ion etching (IBE) rate of LSCMO films was found to be 16 nm/min. Using pre-annealed photoresist patterning, the free standing LSCMO pixels on epitaxial buffer oxide membrane were realized by the IBE and SF 6 inductive coupled plasma (ICP) etching process. These results can be utilized as thermally isolated membrane for heteroepitaxial oxide structures.

Original languageEnglish
Title of host publication2005 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2005 Technical Proceedings
EditorsM. Laudon, B. Romanowicz
Pages521-524
Number of pages4
StatePublished - 2005
Externally publishedYes
Event2005 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2005 - Anaheim, CA, United States
Duration: 8 May 200512 May 2005

Publication series

Name2005 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2005 Technical Proceedings

Conference

Conference2005 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2005
Country/TerritoryUnited States
CityAnaheim, CA
Period8/05/0512/05/05

Keywords

  • Bolometer
  • La(Sr,Ca)Mno (LSCMO)
  • Membrane
  • Micromachining
  • Si

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