LRS retention fail based on joule heating effect in InGaZnO resistive-switching random access memory

Jun Tae Jang, Geumho Ahn, Sung Jin Choi, Dong Myong Kim, Hyungjin Kim, Dae Hwan Kim

Research output: Contribution to journalArticlepeer-review

6 Scopus citations

Abstract

This study reports the low-resistance state retention fail of InGaZnO resistive-switching random access memory (ReRAM) under constant DC bias stress conditions by Joule heating effect. There were the abrupt state changes of InGaZnO ReRAM devices with high voltage stress over 0.6 V because of thermal energy in conducting filament. In addition, SPICE simulation was conducted with verilog-A to verify this retention fail mechanism. We believe these results are potentially useful to the analysis on the retention fail properties of ReRAM devices as well as the system-level simulations with reliability-awareness.

Original languageEnglish
Article number054004
JournalApplied Physics Express
Volume13
Issue number5
DOIs
StatePublished - 1 May 2020

Bibliographical note

Publisher Copyright:
© 2020 The Japan Society of Applied Physics.

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