Large-area graphene films by simple solution casting of edge-selectively functionalized graphite

Seo Yoon Bae; In Yup Jeon; Jieun Yang; Noejung Park; Hyeon Suk Shin; Sungjin Park; Rodney S. Ruoff; Liming Dai; Jong Beom Baek

doi:10.1021/nn201072m

Large-area graphene films by simple solution casting of edge-selectively functionalized graphite

Seo Yoon Bae, In Yup Jeon, Jieun Yang, Noejung Park, Hyeon Suk Shin, Sungjin Park, Rodney S. Ruoff, Liming Dai, Jong Beom Baek

Research output: Contribution to journal › Article › peer-review

87 Scopus citations

Abstract

We report edge-selective functionalization of graphite (EFG) for the production of large-area uniform graphene films by simply solution-casting EFG dispersions in dichloromethane on silicon oxide substrates, followed by annealing. The resultant graphene films show ambipolar transport properties with sheet resistances of 0.52-3.11 kΩ/sq at 63-90% optical transmittance. EFG allows solution processing methods for the scalable production of electrically conductive, optically transparent, and mechanically robust flexible graphene films for use in practice.

Original language	English
Pages (from-to)	4974-4980
Number of pages	7
Journal	ACS Nano
Volume	5
Issue number	6
DOIs	https://doi.org/10.1021/nn201072m
State	Published - 28 Jun 2011

Keywords

annealing
edge-selective functionalization
graphene film
optical transmittance
sheet resistance
solution processing

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10.1021/nn201072m

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abstract = "We report edge-selective functionalization of graphite (EFG) for the production of large-area uniform graphene films by simply solution-casting EFG dispersions in dichloromethane on silicon oxide substrates, followed by annealing. The resultant graphene films show ambipolar transport properties with sheet resistances of 0.52-3.11 kΩ/sq at 63-90% optical transmittance. EFG allows solution processing methods for the scalable production of electrically conductive, optically transparent, and mechanically robust flexible graphene films for use in practice.",

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author = "Bae, {Seo Yoon} and Jeon, {In Yup} and Jieun Yang and Noejung Park and Shin, {Hyeon Suk} and Sungjin Park and Ruoff, {Rodney S.} and Liming Dai and Baek, {Jong Beom}",

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AU - Bae, Seo Yoon

AU - Jeon, In Yup

AU - Yang, Jieun

AU - Park, Noejung

AU - Shin, Hyeon Suk

AU - Park, Sungjin

AU - Ruoff, Rodney S.

AU - Dai, Liming

AU - Baek, Jong Beom

PY - 2011/6/28

Y1 - 2011/6/28

N2 - We report edge-selective functionalization of graphite (EFG) for the production of large-area uniform graphene films by simply solution-casting EFG dispersions in dichloromethane on silicon oxide substrates, followed by annealing. The resultant graphene films show ambipolar transport properties with sheet resistances of 0.52-3.11 kΩ/sq at 63-90% optical transmittance. EFG allows solution processing methods for the scalable production of electrically conductive, optically transparent, and mechanically robust flexible graphene films for use in practice.

AB - We report edge-selective functionalization of graphite (EFG) for the production of large-area uniform graphene films by simply solution-casting EFG dispersions in dichloromethane on silicon oxide substrates, followed by annealing. The resultant graphene films show ambipolar transport properties with sheet resistances of 0.52-3.11 kΩ/sq at 63-90% optical transmittance. EFG allows solution processing methods for the scalable production of electrically conductive, optically transparent, and mechanically robust flexible graphene films for use in practice.

KW - annealing

KW - edge-selective functionalization

KW - graphene film

KW - optical transmittance

KW - sheet resistance

KW - solution processing

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Large-area graphene films by simple solution casting of edge-selectively functionalized graphite

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Keywords

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