Investigation of correlative parameters to evaluate EUV lithographic performance of PMMA

Engineering

• Absorption Coefficient 50%
• Absorptivity 50%
• Critical Dimension 100%
• Edge Roughness 50%
• Experimental Finding 50%
• Experimental Result 50%
• Infrastructure 50%
• Light Source 50%
• Lithography 50%
• Lumped Parameter 50%
• Parameter Model 50%
• Single System 50%
• Test Protocol 50%
• Thick Poly 50%
• Thin Films 50%
• Ultraviolet Light 50%