In2O3 thin films prepared on TiAIN substrates using a triethylindium and oxygen mixture

  • Hyoun Woo Kim
  • , Sun Keun Hwang
  • , Won Seung Cho
  • , Taegyung Ko
  • , Seung Yong Choi
  • , Wan In Lee
  • , Sang Eon Park
  • , Junghoon Joo
  • , Dong Ik Kim
  • , Seong Gyoon Kim
  • , Byung Hak Choe
  • , Seok Hong Min
  • , Jae Ho Choi

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

This paper reports the fabrication of indium oxide (In2O 3) films using a triethylindium and oxygen mixture. The deposition has been carried out on TiAIN substrates (200-350°C). We have established the correlation between the substrate temperature and the structural properties. The films deposited at 300-350°C were polycrystalline, whereas those deposited at 200 °C was close to amorphous. XRD analysis and SEM images indicated that the films grown at 350°C had grained structures with the (222) preferred orientation. The room-temperature photoluminescence spectra of the In2O3 films exhibited a visible light emission.

Original languageEnglish
Title of host publicationAdvances in Nanomaterials and Processing - IUMRS - ICA - 2006 International Conference in Asia
PublisherTrans Tech Publications Ltd
Pages1597-1600
Number of pages4
EditionPART 2
ISBN (Print)3908451310, 9783908451310
DOIs
StatePublished - 2007
EventIUMRS International Conference in Asia 2006, IUMRS-ICA 2006 - Jeju, Korea, Republic of
Duration: 10 Sep 200614 Sep 2006

Publication series

NameSolid State Phenomena
NumberPART 2
Volume124-126
ISSN (Print)1012-0394

Conference

ConferenceIUMRS International Conference in Asia 2006, IUMRS-ICA 2006
Country/TerritoryKorea, Republic of
CityJeju
Period10/09/0614/09/06

Keywords

  • Indium oxide
  • Thin films
  • TiAiN

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