In2O3 thin films prepared on TiAIN substrates using a triethylindium and oxygen mixture

Hyoun Woo Kim, Sun Keun Hwang, Won Seung Cho, Taegyung Ko, Seung Yong Choi, Wan In Lee, Sang Eon Park, Junghoon Joo, Dong Ik Kim, Seong Gyoon Kim, Byung Hak Choe, Seok Hong Min, Jae Ho Choi

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

This paper reports the fabrication of indium oxide (In2O 3) films using a triethylindium and oxygen mixture. The deposition has been carried out on TiAIN substrates (200-350°C). We have established the correlation between the substrate temperature and the structural properties. The films deposited at 300-350°C were polycrystalline, whereas those deposited at 200 °C was close to amorphous. XRD analysis and SEM images indicated that the films grown at 350°C had grained structures with the (222) preferred orientation. The room-temperature photoluminescence spectra of the In2O3 films exhibited a visible light emission.

Original languageEnglish
Title of host publicationAdvances in Nanomaterials and Processing - IUMRS - ICA - 2006 International Conference in Asia
PublisherTrans Tech Publications Ltd
Pages1597-1600
Number of pages4
EditionPART 2
ISBN (Print)3908451310, 9783908451310
DOIs
StatePublished - 2007
EventIUMRS International Conference in Asia 2006, IUMRS-ICA 2006 - Jeju, Korea, Republic of
Duration: 10 Sep 200614 Sep 2006

Publication series

NameSolid State Phenomena
NumberPART 2
Volume124-126
ISSN (Print)1012-0394

Conference

ConferenceIUMRS International Conference in Asia 2006, IUMRS-ICA 2006
Country/TerritoryKorea, Republic of
CityJeju
Period10/09/0614/09/06

Keywords

  • Indium oxide
  • Thin films
  • TiAiN

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