Influence of thermal decomposition behavior of titanium precursors on (Ba,Sr)TiO3 thin films

Y. S. Min; Y. J. Cho; D. Kim; J. H. Lee; B. M. Kim; S. K. Lim; I. M. Lee; W. I. Lee

doi:10.1051/jp4:2001386

Influence of thermal decomposition behavior of titanium precursors on (Ba,Sr)TiO₃ thin films

Y. S. Min, Y. J. Cho, D. Kim, J. H. Lee, B. M. Kim, S. K. Lim, I. M. Lee, W. I. Lee

Samsung

Research output: Contribution to journal › Conference article › peer-review

Abstract

An N-alkoxy-β-ketoiminato titanium complex, Ti(2meip)₂ (2meip = 4-(2-methylethoxy)imino-2-pentanoate), was investigated as a Ti precursor for BST thin film growth, and compared with Ti(thd)₂(O-iPr)₂ (thd = 2,2,6,6-tetramethyl-3,5-heptandionate) and Ti(mpd)(thd)₂ (mpd = 2-methyl-2,4-petanedioxy) in terms of thermal decomposition properties. It shows a moderate volatility, chemical and thermal stability, and a simple decomposition behavior above 315°C. The deposited BST films with this novel precursor by liquid delivery metal-organic chemical vapor deposition (LS-MOCVD) demonstrate ultra-smooth surface without humps or hazy appearance, and relatively less variation of the titanium composition along the deposition temperature as compared with other titanium precursors, presumably due to easy and clean decomposition behavior of Ti(2meip)₂. The as-deposited BST films are beginning to crystallize at 430°C without additional annealing process.

Original language	English
Pages (from-to)	Pr3675-Pr3682
Journal	Journal De Physique. IV : JP
Volume	11
Issue number	3
DOIs	https://doi.org/10.1051/jp4:2001386
State	Published - 2001
Event	13th European Conference on Chemical Vapor Deposition (EUROCVD 13) - Athens, Greece Duration: 26 Aug 2001 → 31 Aug 2001

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@article{b5f79491615a467c9e1778ebb3a4aa2d,

title = "Influence of thermal decomposition behavior of titanium precursors on (Ba,Sr)TiO3 thin films",

abstract = "An N-alkoxy-β-ketoiminato titanium complex, Ti(2meip)2 (2meip = 4-(2-methylethoxy)imino-2-pentanoate), was investigated as a Ti precursor for BST thin film growth, and compared with Ti(thd)2(O-iPr)2 (thd = 2,2,6,6-tetramethyl-3,5-heptandionate) and Ti(mpd)(thd)2 (mpd = 2-methyl-2,4-petanedioxy) in terms of thermal decomposition properties. It shows a moderate volatility, chemical and thermal stability, and a simple decomposition behavior above 315°C. The deposited BST films with this novel precursor by liquid delivery metal-organic chemical vapor deposition (LS-MOCVD) demonstrate ultra-smooth surface without humps or hazy appearance, and relatively less variation of the titanium composition along the deposition temperature as compared with other titanium precursors, presumably due to easy and clean decomposition behavior of Ti(2meip)2. The as-deposited BST films are beginning to crystallize at 430°C without additional annealing process.",

author = "Min, {Y. S.} and Cho, {Y. J.} and D. Kim and Lee, {J. H.} and Kim, {B. M.} and Lim, {S. K.} and Lee, {I. M.} and Lee, {W. I.}",

year = "2001",

doi = "10.1051/jp4:2001386",

language = "English",

volume = "11",

pages = "Pr3675--Pr3682",

journal = "Journal De Physique. IV : JP",

issn = "1155-4339",

publisher = "Springer Verlag",

number = "3",

note = "13th European Conference on Chemical Vapor Deposition (EUROCVD 13) ; Conference date: 26-08-2001 Through 31-08-2001",

}

TY - JOUR

T1 - Influence of thermal decomposition behavior of titanium precursors on (Ba,Sr)TiO3 thin films

AU - Min, Y. S.

AU - Cho, Y. J.

AU - Kim, D.

AU - Lee, J. H.

AU - Kim, B. M.

AU - Lim, S. K.

AU - Lee, I. M.

AU - Lee, W. I.

PY - 2001

Y1 - 2001

N2 - An N-alkoxy-β-ketoiminato titanium complex, Ti(2meip)2 (2meip = 4-(2-methylethoxy)imino-2-pentanoate), was investigated as a Ti precursor for BST thin film growth, and compared with Ti(thd)2(O-iPr)2 (thd = 2,2,6,6-tetramethyl-3,5-heptandionate) and Ti(mpd)(thd)2 (mpd = 2-methyl-2,4-petanedioxy) in terms of thermal decomposition properties. It shows a moderate volatility, chemical and thermal stability, and a simple decomposition behavior above 315°C. The deposited BST films with this novel precursor by liquid delivery metal-organic chemical vapor deposition (LS-MOCVD) demonstrate ultra-smooth surface without humps or hazy appearance, and relatively less variation of the titanium composition along the deposition temperature as compared with other titanium precursors, presumably due to easy and clean decomposition behavior of Ti(2meip)2. The as-deposited BST films are beginning to crystallize at 430°C without additional annealing process.

AB - An N-alkoxy-β-ketoiminato titanium complex, Ti(2meip)2 (2meip = 4-(2-methylethoxy)imino-2-pentanoate), was investigated as a Ti precursor for BST thin film growth, and compared with Ti(thd)2(O-iPr)2 (thd = 2,2,6,6-tetramethyl-3,5-heptandionate) and Ti(mpd)(thd)2 (mpd = 2-methyl-2,4-petanedioxy) in terms of thermal decomposition properties. It shows a moderate volatility, chemical and thermal stability, and a simple decomposition behavior above 315°C. The deposited BST films with this novel precursor by liquid delivery metal-organic chemical vapor deposition (LS-MOCVD) demonstrate ultra-smooth surface without humps or hazy appearance, and relatively less variation of the titanium composition along the deposition temperature as compared with other titanium precursors, presumably due to easy and clean decomposition behavior of Ti(2meip)2. The as-deposited BST films are beginning to crystallize at 430°C without additional annealing process.

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U2 - 10.1051/jp4:2001386

DO - 10.1051/jp4:2001386

M3 - Conference article

AN - SCOPUS:0034855888

SN - 1155-4339

VL - 11

SP - Pr3675-Pr3682

JO - Journal De Physique. IV : JP

JF - Journal De Physique. IV : JP

IS - 3

T2 - 13th European Conference on Chemical Vapor Deposition (EUROCVD 13)

Y2 - 26 August 2001 through 31 August 2001

ER -

Influence of thermal decomposition behavior of titanium precursors on (Ba,Sr)TiO₃ thin films

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