Original language | English |
---|---|
Pages (from-to) | 377-380 |
Number of pages | 4 |
Journal | Studies in Surface Science and Catalysis |
Volume | 159 |
DOIs | |
State | Published - 2006 |
Inductively coupled plasma reactive ion etching of Co2MnSi magnetic films for magnetic random access memory
Byul Shin, Hyun Park Ik, Won Chung Chee
Research output: Contribution to journal › Article › peer-review
2
Scopus
citations