Implication of polarity dependence degradation on NMOSFET with polysilicon/Hf-silicate gate stack

Rino Choi, B. H. Lee, C. D. Young, J. H. Sim, K. Mathews, G. Bersuker, P. Zeitzoff

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Original languageEnglish
Title of host publication2005 IEEE International Reliability Physics Symposium Proceedings, 43rd Annual
Pages636-637
Number of pages2
StatePublished - 2005
Externally publishedYes
Event2005 IEEE International Reliability Physics Symposium Proceedings, 43rd Annual - San Jose, CA, United States
Duration: 17 Apr 200521 Apr 2005

Publication series

NameIEEE International Reliability Physics Symposium Proceedings
ISSN (Print)1541-7026

Conference

Conference2005 IEEE International Reliability Physics Symposium Proceedings, 43rd Annual
Country/TerritoryUnited States
CitySan Jose, CA
Period17/04/0521/04/05

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