Highly selective etching of SnO 2 absorber in binary mask structure for extreme ultra-violet lithography

Soo Jin Lee, Chang Yong Jung, Sung Jin Park, Chang Kweun Hwangbo, Hwan Seok Seo, Sung Soo Kim, Nae Eung Lee

Research output: Contribution to journalArticlepeer-review

Fingerprint

Dive into the research topics of 'Highly selective etching of SnO 2 absorber in binary mask structure for extreme ultra-violet lithography'. Together they form a unique fingerprint.

Material Science