Growth of ZnO thin films by metalorganic chemical vapor deposition using isopropyl alcohol for oxygen precursor

Jae Young Park, Yong Sung Hong, Sang Sub Kim

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

1 Scopus citations

Abstract

ZnO thin films were synthesized by metalorganic chemical vapor deposition on Al2O3 (0001) substrates particularly using isopropyl alcohol for oxygen precursor. Change in microstructure was investigated depending on the growth temperature and the O/Zn precursor ratio. Under an optimized condition, ZnO thin films having a very smooth surface and dense cross-sectional microstructure were obtained while possessing epitaxial crystalline alignment. However, the photoluminescent spectrum lacks the band-edge emission.

Original languageEnglish
Title of host publicationEco-Materials Processing and Design VII - Proceedings of the Conference of the 7th International Symposium on Eco-Materials Processing and Design, ISEPD-7
PublisherTrans Tech Publications Ltd
Pages998-1001
Number of pages4
ISBN (Print)0878499954, 9780878499953
DOIs
StatePublished - 2006
Externally publishedYes
Event7th International Symposium on Eco-Materials Processing and Design, ISEPD-7 - Chengdu, China
Duration: 8 Jan 200611 Jan 2006

Publication series

NameMaterials Science Forum
Volume510-511
ISSN (Print)0255-5476
ISSN (Electronic)1662-9752

Conference

Conference7th International Symposium on Eco-Materials Processing and Design, ISEPD-7
Country/TerritoryChina
CityChengdu
Period8/01/0611/01/06

Keywords

  • Alcohol precursor
  • MOCVD
  • Morphology
  • Zno thin films

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