Abstract
Ar ion beam etching and inductively coupled S F6 and C4 F8 plasma-etching processes have been employed to fabricate free standing membrane from the heteroepitaxial La1-x (Sr,Ca)x Mn O3 (50 nm) Bi4 Ti3 O12 (100 nm) Ce O2 (40 nm) YSZ (30 nm) film structure pulsed laser deposited on Si(001) wafer. We demonstrate feasibility to use epitaxial colossal magnetoresistive manganite film as thermally isolated self-supporting membrane for uncooled infrared microbolometer applications.
Original language | English |
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Article number | 033502 |
Journal | Applied Physics Letters |
Volume | 87 |
Issue number | 3 |
DOIs | |
State | Published - 18 Jul 2005 |
Externally published | Yes |