Fluoroalkylated tin-oxo nano clusters as resist candidates for extreme UV lithography

  • Yejin Ku
  • , Hyungju Ahn
  • , Jin Kyun Lee
  • , Jiho Kim
  • , Byeong Gyu Park
  • , Sangsul Lee
  • , Yu Ha Jang
  • , Byung Jun Jung
  • , Chawon Koh
  • , Tsunehiro Nishi
  • , Hyun Woo Kim

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

1 Scopus citations

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