Electrochemical etching of a niobium foil in methanolic HF for electrolytic capacitor

Kyungmin Kim; Jiyoung Park; Gihoon Cha; Jeong Eun Yoo; Jinsub Choi

doi:10.1016/j.matchemphys.2013.06.008

Electrochemical etching of a niobium foil in methanolic HF for electrolytic capacitor

Kyungmin Kim, Jiyoung Park, Gihoon Cha, Jeong Eun Yoo, Jinsub Choi

Inha University

Research output: Contribution to journal › Article › peer-review

9 Scopus citations

Abstract

Electrochemical etching of niobium foil in order to enlarge the surface area for the application in electrolytic capacitor was carried out in a methanolic electrolyte. We found that the pit density and depth are not linearly proportional to concentration of HF and applied potential: there is the optimal concentration of HF at each applied potential. The optimal etching condition was obtained at 50 V in 0.99 vol.% HF, which exhibited the capacitance of 350 μF cm^-2. Pit density and depth of pits on electrochemical etched Nb foil under different conditions were counted from SEM images and electrochemical impedance spectroscopy (EIS) of the etched Nb foils was carried out for the capacitance measurement. Equivalent circuit model showing less than 5% error was suggested for applying to the etched niobium foil.

Original language	English
Pages (from-to)	810-815
Number of pages	6
Journal	Materials Chemistry and Physics
Volume	141
Issue number	2-3
DOIs	https://doi.org/10.1016/j.matchemphys.2013.06.008
State	Published - 16 Sep 2013

Bibliographical note

Funding Information:
This study was supported by R & D program of Korea Evaluation Institute of Industrial Technology (KEIT) funded by the Korea Government of Ministry of Industry and Trade [No. 10038375 , Development of Thin Film Multi-Layer Capacitor with capacitance 3uF(±3) and 50 mm × 50 mm × 5 mm Using Nano Pore Structure].

Keywords

Electrochemical techniques
Etching
Metals
Microstructure
Surfaces

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10.1016/j.matchemphys.2013.06.008

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title = "Electrochemical etching of a niobium foil in methanolic HF for electrolytic capacitor",

abstract = "Electrochemical etching of niobium foil in order to enlarge the surface area for the application in electrolytic capacitor was carried out in a methanolic electrolyte. We found that the pit density and depth are not linearly proportional to concentration of HF and applied potential: there is the optimal concentration of HF at each applied potential. The optimal etching condition was obtained at 50 V in 0.99 vol.% HF, which exhibited the capacitance of 350 μF cm-2. Pit density and depth of pits on electrochemical etched Nb foil under different conditions were counted from SEM images and electrochemical impedance spectroscopy (EIS) of the etched Nb foils was carried out for the capacitance measurement. Equivalent circuit model showing less than 5% error was suggested for applying to the etched niobium foil.",

keywords = "Electrochemical techniques, Etching, Metals, Microstructure, Surfaces",

author = "Kyungmin Kim and Jiyoung Park and Gihoon Cha and Yoo, {Jeong Eun} and Jinsub Choi",

note = "Funding Information: This study was supported by R & D program of Korea Evaluation Institute of Industrial Technology (KEIT) funded by the Korea Government of Ministry of Industry and Trade [No. 10038375 , Development of Thin Film Multi-Layer Capacitor with capacitance 3uF(±3) and 50 mm × 50 mm × 5 mm Using Nano Pore Structure].",

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doi = "10.1016/j.matchemphys.2013.06.008",

language = "English",

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T1 - Electrochemical etching of a niobium foil in methanolic HF for electrolytic capacitor

AU - Kim, Kyungmin

AU - Park, Jiyoung

AU - Cha, Gihoon

AU - Yoo, Jeong Eun

AU - Choi, Jinsub

N1 - Funding Information: This study was supported by R & D program of Korea Evaluation Institute of Industrial Technology (KEIT) funded by the Korea Government of Ministry of Industry and Trade [No. 10038375 , Development of Thin Film Multi-Layer Capacitor with capacitance 3uF(±3) and 50 mm × 50 mm × 5 mm Using Nano Pore Structure].

PY - 2013/9/16

Y1 - 2013/9/16

N2 - Electrochemical etching of niobium foil in order to enlarge the surface area for the application in electrolytic capacitor was carried out in a methanolic electrolyte. We found that the pit density and depth are not linearly proportional to concentration of HF and applied potential: there is the optimal concentration of HF at each applied potential. The optimal etching condition was obtained at 50 V in 0.99 vol.% HF, which exhibited the capacitance of 350 μF cm-2. Pit density and depth of pits on electrochemical etched Nb foil under different conditions were counted from SEM images and electrochemical impedance spectroscopy (EIS) of the etched Nb foils was carried out for the capacitance measurement. Equivalent circuit model showing less than 5% error was suggested for applying to the etched niobium foil.

AB - Electrochemical etching of niobium foil in order to enlarge the surface area for the application in electrolytic capacitor was carried out in a methanolic electrolyte. We found that the pit density and depth are not linearly proportional to concentration of HF and applied potential: there is the optimal concentration of HF at each applied potential. The optimal etching condition was obtained at 50 V in 0.99 vol.% HF, which exhibited the capacitance of 350 μF cm-2. Pit density and depth of pits on electrochemical etched Nb foil under different conditions were counted from SEM images and electrochemical impedance spectroscopy (EIS) of the etched Nb foils was carried out for the capacitance measurement. Equivalent circuit model showing less than 5% error was suggested for applying to the etched niobium foil.

KW - Electrochemical techniques

KW - Etching

KW - Metals

KW - Microstructure

KW - Surfaces

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U2 - 10.1016/j.matchemphys.2013.06.008

DO - 10.1016/j.matchemphys.2013.06.008

M3 - Article

AN - SCOPUS:84881139508

SN - 0254-0584

VL - 141

SP - 810

EP - 815

JO - Materials Chemistry and Physics

JF - Materials Chemistry and Physics

IS - 2-3

ER -

Electrochemical etching of a niobium foil in methanolic HF for electrolytic capacitor

Abstract

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