Electrical and optical properties of Y-doped indium zinc oxide films grown by RF magnetron sputtering

Engineering

• Deposited Film 100%
• Magnetron 100%
• Room Temperature 100%
• Oxide Film 100%
• Carrier Concentration 100%
• Oxide Layer 50%
• Ray Diffraction 50%
• X-Ray Diffraction Pattern 50%
• Deposition Temperature 50%
• Amorphous Phase 50%
• Oxygen Partial Pressure 50%
• Phase Structure 50%
• Glass Substrate 50%

Material Science

• Magnetron Sputtering 100%
• Oxide Film 100%
• Zinc Oxide 100%
• Indium 100%
• Film 100%
• X-Ray Diffraction 25%
• Carrier Concentration 25%
• Electrical Resistivity 12%
• ZnO 12%
• Diffraction Pattern 12%
• Phase Structure 12%