Abstract
Results of detailed characterization indicate that the PL emission and the microstructure of ZnO/Si films grown by RF magnetron sputtering are significantly improved by increasing growth temperature and inserting low temperature buffer layer.
Original language | English |
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Title of host publication | 2003 International Symposium on Compound Semiconductors, ISCS 2003 |
Publisher | Institute of Electrical and Electronics Engineers Inc. |
Pages | 119-120 |
Number of pages | 2 |
ISBN (Electronic) | 0780378202 |
DOIs | |
State | Published - 2003 |
Externally published | Yes |
Event | 2003 International Symposium on Compound Semiconductors, ISCS 2003 - San Diego, United States Duration: 25 Aug 2003 → 27 Aug 2003 |
Publication series
Name | IEEE International Symposium on Compound Semiconductors, Proceedings |
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Volume | 2003-January |
Conference
Conference | 2003 International Symposium on Compound Semiconductors, ISCS 2003 |
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Country/Territory | United States |
City | San Diego |
Period | 25/08/03 → 27/08/03 |
Bibliographical note
Publisher Copyright:© 2003 IEEE.
Keywords
- Buffer layers
- Crystallization
- Excitons
- Microstructure
- Radio frequency
- Scanning electron microscopy
- Semiconductor films
- Sputtering
- Temperature
- Zinc oxide