Directed assembly of lamellae forming block copolymer thin films near the order-disorder transition

Sangwon Kim; Paul F. Nealey; Frank S. Bates

doi:10.1021/nl403628d

Directed assembly of lamellae forming block copolymer thin films near the order-disorder transition

Sangwon Kim, Paul F. Nealey, Frank S. Bates

Research output: Contribution to journal › Article › peer-review

50 Scopus citations

Abstract

The impact of thin film confinement on the ordering of lamellae was investigated using symmetric poly(styrene-b-[isoprene-ran-epoxyisoprene]) diblock copolymers bound by nonpreferential wetting interfaces. The order-disorder transition temperature (T_ODT) and the occurrence of composition fluctuations in the disordered state are not significantly affected by two-dimensional confinement. Directed self-assembly using chemical patterning is demonstrated near T_ODT. These results establish the minimum feature size attainable using directed self-assembly of a given diblock copolymer system.

Original language	English
Pages (from-to)	148-152
Number of pages	5
Journal	Nano Letters
Volume	14
Issue number	1
DOIs	https://doi.org/10.1021/nl403628d
State	Published - 8 Jan 2014
Externally published	Yes

Keywords

Block copolymer
directed self-assembly
fluctuation
lithography
thin film

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10.1021/nl403628d

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abstract = "The impact of thin film confinement on the ordering of lamellae was investigated using symmetric poly(styrene-b-[isoprene-ran-epoxyisoprene]) diblock copolymers bound by nonpreferential wetting interfaces. The order-disorder transition temperature (TODT) and the occurrence of composition fluctuations in the disordered state are not significantly affected by two-dimensional confinement. Directed self-assembly using chemical patterning is demonstrated near TODT. These results establish the minimum feature size attainable using directed self-assembly of a given diblock copolymer system.",

keywords = "Block copolymer, directed self-assembly, fluctuation, lithography, thin film",

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AB - The impact of thin film confinement on the ordering of lamellae was investigated using symmetric poly(styrene-b-[isoprene-ran-epoxyisoprene]) diblock copolymers bound by nonpreferential wetting interfaces. The order-disorder transition temperature (TODT) and the occurrence of composition fluctuations in the disordered state are not significantly affected by two-dimensional confinement. Directed self-assembly using chemical patterning is demonstrated near TODT. These results establish the minimum feature size attainable using directed self-assembly of a given diblock copolymer system.

KW - Block copolymer

KW - directed self-assembly

KW - fluctuation

KW - lithography

KW - thin film

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ER -

Directed assembly of lamellae forming block copolymer thin films near the order-disorder transition

Abstract

Keywords

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