| Original language | English |
|---|---|
| Pages (from-to) | 2026-2028 |
| Number of pages | 3 |
| Journal | Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures |
| Volume | 21 |
| Issue number | 5 |
| DOIs | |
| State | Published - 2003 |
| Externally published | Yes |
Characterization of resistivity and work function of sputtered-TaN film for gate electrode applications
Chang Seok Kang, H. J. Cho, Y. H. Kim, R. Choi, K. Onishi, A. Shahriar, J. C. Lee
Research output: Contribution to journal › Article › peer-review
94
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