Acid-diffusion behaviour in organic thin films and its effect on patterning

Jin Kyun Lee; Margarita Chatzichristidi; Alexander A. Zakhidov; Ha Soo Hwang; Evan L. Schwartz; Jing Sha; Priscilla G. Taylor; Hon Hang Fong; John A. Defranco; Eisuke Murotani; Wallace W.H. Wong; George G. Malliaras; Christopher K. Ober

doi:10.1039/b817286b

Acid-diffusion behaviour in organic thin films and its effect on patterning

Jin Kyun Lee, Margarita Chatzichristidi, Alexander A. Zakhidov, Ha Soo Hwang, Evan L. Schwartz, Jing Sha, Priscilla G. Taylor, Hon Hang Fong, John A. Defranco, Eisuke Murotani, Wallace W.H. Wong, George G. Malliaras, Christopher K. Ober

Research output: Contribution to journal › Article › peer-review

19 Scopus citations

Abstract

Acid and its formation and placement is one of the most important aspects in the chemically amplified photolithographic process. The choice of photoacid generator (PAG) in the photolithographic patterning of acidic substrates, such as PEDOT:PSS, has consequences for the resolution and overall quality of the patterned image. In this study, an acid exchange and diffusion mechanism is proposed for the undesired decomposition of the unexposed photoresist layer containing ionic PAGs. The use of non-ionic PAGs has been shown to be a solution to this decomposition problem. In addition, the acidic nature of the PEDOT:PSS substrate is employed to produce patterned images of a cross-linkable light-emitting polymer. With further optimization and development, this is potentially a fast and simple method to introduce patterns in various organic electronic devices.

Original language	English
Pages (from-to)	2986-2992
Number of pages	7
Journal	Journal of Materials Chemistry
Volume	19
Issue number	19
DOIs	https://doi.org/10.1039/b817286b
State	Published - 2009
Externally published	Yes

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title = "Acid-diffusion behaviour in organic thin films and its effect on patterning",

abstract = "Acid and its formation and placement is one of the most important aspects in the chemically amplified photolithographic process. The choice of photoacid generator (PAG) in the photolithographic patterning of acidic substrates, such as PEDOT:PSS, has consequences for the resolution and overall quality of the patterned image. In this study, an acid exchange and diffusion mechanism is proposed for the undesired decomposition of the unexposed photoresist layer containing ionic PAGs. The use of non-ionic PAGs has been shown to be a solution to this decomposition problem. In addition, the acidic nature of the PEDOT:PSS substrate is employed to produce patterned images of a cross-linkable light-emitting polymer. With further optimization and development, this is potentially a fast and simple method to introduce patterns in various organic electronic devices.",

author = "Lee, {Jin Kyun} and Margarita Chatzichristidi and Zakhidov, {Alexander A.} and Hwang, {Ha Soo} and Schwartz, {Evan L.} and Jing Sha and Taylor, {Priscilla G.} and Fong, {Hon Hang} and Defranco, {John A.} and Eisuke Murotani and Wong, {Wallace W.H.} and Malliaras, {George G.} and Ober, {Christopher K.}",

year = "2009",

doi = "10.1039/b817286b",

language = "English",

volume = "19",

pages = "2986--2992",

journal = "Journal of Materials Chemistry",

issn = "0959-9428",

publisher = "Royal Society of Chemistry",

number = "19",

}

TY - JOUR

T1 - Acid-diffusion behaviour in organic thin films and its effect on patterning

AU - Lee, Jin Kyun

AU - Chatzichristidi, Margarita

AU - Zakhidov, Alexander A.

AU - Hwang, Ha Soo

AU - Schwartz, Evan L.

AU - Sha, Jing

AU - Taylor, Priscilla G.

AU - Fong, Hon Hang

AU - Defranco, John A.

AU - Murotani, Eisuke

AU - Wong, Wallace W.H.

AU - Malliaras, George G.

AU - Ober, Christopher K.

PY - 2009

Y1 - 2009

N2 - Acid and its formation and placement is one of the most important aspects in the chemically amplified photolithographic process. The choice of photoacid generator (PAG) in the photolithographic patterning of acidic substrates, such as PEDOT:PSS, has consequences for the resolution and overall quality of the patterned image. In this study, an acid exchange and diffusion mechanism is proposed for the undesired decomposition of the unexposed photoresist layer containing ionic PAGs. The use of non-ionic PAGs has been shown to be a solution to this decomposition problem. In addition, the acidic nature of the PEDOT:PSS substrate is employed to produce patterned images of a cross-linkable light-emitting polymer. With further optimization and development, this is potentially a fast and simple method to introduce patterns in various organic electronic devices.

AB - Acid and its formation and placement is one of the most important aspects in the chemically amplified photolithographic process. The choice of photoacid generator (PAG) in the photolithographic patterning of acidic substrates, such as PEDOT:PSS, has consequences for the resolution and overall quality of the patterned image. In this study, an acid exchange and diffusion mechanism is proposed for the undesired decomposition of the unexposed photoresist layer containing ionic PAGs. The use of non-ionic PAGs has been shown to be a solution to this decomposition problem. In addition, the acidic nature of the PEDOT:PSS substrate is employed to produce patterned images of a cross-linkable light-emitting polymer. With further optimization and development, this is potentially a fast and simple method to introduce patterns in various organic electronic devices.

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U2 - 10.1039/b817286b

DO - 10.1039/b817286b

M3 - Article

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SN - 0959-9428

VL - 19

SP - 2986

EP - 2992

JO - Journal of Materials Chemistry

JF - Journal of Materials Chemistry

IS - 19

ER -

Acid-diffusion behaviour in organic thin films and its effect on patterning

Abstract

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