A novel bias temperature instability characterization methodology for high-k MOSFETs

Dawei Heh, Gennadi Bersuker, Rino Choi, Chadwin D. Young, Byoung Hun Lee

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

6 Scopus citations

Abstract

A characterization methodology based on a single pulse measurement for evaluating the bias temperature instability (BTI) of high-k devices has been developed. It is shown that the time dependence of the threshold voltage instability extracted from conventional DC and pulse Id-Vg measurements can be affected by the fast charge relaxation process leading to erroneous predictions of lifetime. The proposed methodology separates the relaxation effects associated with the fast transient and slower constant voltage charging and allows extracting the dependence of intrinsic threshold voltage on stress time.

Original languageEnglish
Title of host publicationESSDERC 2006 - Proceedings of the 36th European Solid-State Device Research Conference
PublisherIEEE Computer Society
Pages387-390
Number of pages4
ISBN (Print)1424403014, 9781424403011
DOIs
StatePublished - 2006
Externally publishedYes
EventESSDERC 2006 - 36th European Solid-State Device Research Conference - Montreux, Switzerland
Duration: 19 Sep 200621 Sep 2006

Publication series

NameESSDERC 2006 - Proceedings of the 36th European Solid-State Device Research Conference

Conference

ConferenceESSDERC 2006 - 36th European Solid-State Device Research Conference
Country/TerritorySwitzerland
CityMontreux
Period19/09/0621/09/06

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