Choi, J. W., Kim, M., Safron, N. S., Han, E., Arnold, M. S. & Gopalan, P., 2015, Advanced Etch Technology for Nanopatterning IV. Lin, Q. & Engelmann, S. U. (eds.). SPIE, 94280T. (Proceedings of SPIE - The International Society for Optical Engineering; vol. 9428).
Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review